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Jiyoung Kim

Associate Professor


1994 PhD, Materials Science and Engineering, University of Texas at Austin
1988 MS, Metallurgical Engineering, Seoul National University
1986 BS, Metallurgical Engineering, Seoul National University

Research Summary

  • Advanced Materials and Novel Devices for Information Technology
  • Novel thin film processing including ALD (Atomic Layer Deposition),  unique applications to 3-D nanostructures (such as Nanotubes), low temperature selective deposition, and CMOS applications
  • Gate Stack Engineering for More Moore and More than Moore Applications
  • Graphene and its fabrication and device applications
  • Nano organic/inorganic hybrid materials and devices
  • Novel memory device materials, fabrication and applications
  • Flexible electronics including flexible transparent electrodes
  • Nano-sensor and Nano-fabrication
  • Nanomaterials for energy applications

Selected Publications

  • B. Lee, G. Mordi, M.J. Kim, Y. J. Chabal, E. M. Vogel, R. M. Wallace, KJ Cho, J. Kim, L. Colombo, “Charactreristics of high-k Al2O3  dielectric using ozone based atomic layer deposition,” Appl. Phys. Lett., 97, 043107 (2010)

  • T. J. Park, P. Sivasubramani, B. E. Coss, H.-C. Kim, B. Lee, R. M. Wallace, J. Kim, “Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in-situ x-ray photoelectron spectroscopy,” Appl. Phys. Lett., 97, 092904 (2010)

  • J. Kim, T. W. Kim, “Initial surface reactions of atomic layer deposition,” JOM, 61(6), pp.19-24 (2009) (Invited review article)

  • C. Bae, H. Yoo, S. Kim, K. Lee, J. Kim, M. Sung, H. Shin, “Template directed oxide nanotubes: Synthesis, characterization, and applications,” Chem. Mater. 20 (3), pp. 756-767 (2008)

  • H. Shin, D. Jung, J. Lee, M. Sung and J. Kim, “Formation of TiO2 and ZrO2 Nanotubes Using Atomic Layer Deposition with Ultra-Precise Wall Thickness Control,” Advanced Materials, 16 (14), pp. 1197-1200 (2004).